Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...

A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...

Atomic layer deposition (ALD) is a surface-controlled chemical vapour deposition method, in which materials are prepared one atomic layer at the time. With ALD, film thickness can be controlled very ...

Based on historical development, manufacturing technologies can be divided into three phases: Craft-based manufacturing by hand with millimeters or sub-millimeters precision; Precision-controllable ...